Idea Transcript
P R O D U C T C ATA L O G U E Volume 1
This page has intentionally been left blank
2.
EDWARDS
OUR MARKETS
Using our experience and expertise, we can provide the best vacuum solution for your application needs.
Chemical and Process Industries 5 Flat Panel Display
11
Industrial Vacuum 13 LED 23 Photovoltaic 27 Power Generation
31
R&D 35 Scientific Instruments
43
Semiconductor Processing
47
Steel Degassing 53 Shop online at shop.edwardsvacuum.com
Contact our customer service team
3.
This page has intentionally been left blank
4.
CHEMICAL AND PROCESS INDUSTRIES
MORE THAN PUMPS, COMPLETE VACUUM SOLUTIONS
Chemical and Process Industries 6 Petrochemicals 8 Pharmaceuticals 8 Specialty and Fine Chemicals 9
Shop online at shop.edwardsvacuum.com
Contact our customer service team
5.
CHEMICAL AND PROCESS INDUSTRIES Many chemical processing and manufacturing applications require vacuum, for a wide variety of purposes and benefits. Vacuum pumping systems need to handle organic solvents and compounds in a reliable and safe way while ensuring control and reduction of environmental pollution and cost of ownership. Edwards has developed comprehensive dry solutions for vacuum pumping applications in the chemical process industries to address these challenges. With over 25 years’ experience in these industries we are a world leader in the design, technology and manufacture of dry vacuum pumps for process applications. Benefits: • Robust and environmentally friendly - clean, reliable dry vacuum solutions • Low cost of ownership - low maintenance and utilities costs • Not just pumps, complete solutions - fully engineered vacuum systems
Chemical Dry Pumps
Mechanical Boosters
Rotary Piston Pumps
Rotary Vane Pumps
Liquid Ring Pumps
Steam Ejectors
Key Applications
Pumping Technology
Normal Distillation
●
●
○
○
●
●
Short Path Distillation
●
●
○
○
Molecular Distillation
●
●
○
○
Reactor Service
●
●
○
Central Vacuum (flammables and corrosives)
●
●
●
Fatty Acid Deodorisation, Biofuels
●
●
●
●
Drying, Evaporation, Crystallisation, Concentration
●
●
Gas Recovery/ Recirculation
●
●
Degassing
○
○
Absorption, Adsorption, Desorption
●
●
●
Pervaporation
●
●
●
Solvent Recovery
●
●
○
Isocyanates Production
●
●
○
●
Impregnation
●
●
●
●
●
Polymers and Plastics Production
●
●
○
○
●
●
Paints, Pigments, Coatings and Ink Production
●
●
○
●
○
○
Soaps/ Detergents Production
●
●
○
Ethylene Oxide Sterilisation
●
●
Oil Treatment Plants
●
●
Dewatering and Filtration
○
Flammable and Corrosive Gases
●
●
Lowest Cost of Ownership (Typically)
●
Preferred Technology or Widespread Use
High Cost of Ownership (Typically)
○
Some Applications
Highest Cost of Ownership (Typically)
6.
Chemical & Process Industries
● ○
●
●
○
○
○
○
○
○
●
○
○
●
● ●
●
○
○
○
● ○
●
●
Recommended Technology: CXS Dry Screw Vacuum Pumps
CXS is Edwards most advanced chemical dry pump featuring new tapered-screw technology for exceptional energy efficiency and performance. -- Low installation costs - integral controller and safety systems for ‘Plug and Pump’, flexible operation -- Robust and reliable - cutting edge screw technology for corrosion-free operation and robust liquid and solids handling during process upsets -- Environmentally friendly - smooth, quiet running,
48.
○
iXL
○
○
○
○
○
○
EPX
○
○
○
○
○
○
STP-iXR Series
○
○
○
○
○
○
STP-iX Series
○
○
○
○
○
○
Pumps
STP-iXA Series STP-iXL
○
STP-L
○
○
○
○
○
Abatement
Systems Solutions
○
○
○
○
○
○
○
○
○
GRC
EZENITH
Semiconductor Processing
○
○
○
○
○
○
○
○
○
○
○
○
○
○
○
○
○
○
○
○
○
○
ATLAS
Integrated
Turbomolecular
Dry Pumps
iXH iGX
○
○
○
○
○
○
○
○
○
○
○
○
○
○
Lithography Lithography, patterning of the wafers, is a critical step in the semiconductor process. Although conventional and even immersion lithography generally do not require vacuum environments, extreme ultraviolet (EUV) lithography and electron beam (e-beam) lithography do require vacuum pumps. Edwards has you covered for both of these applications. EUV Lithography Pumping Solutions Multi-patterning techniques have their place, but the future will likely require the use of EUV lithography due to the extremely short wavelength of light EUV systems deliver. The vacuum environment is absolutely critical for optimum performance of your system. Cleanliness of the vacuum system is particularly important and helps to extend service intervals. We have worked with EUV Lithography OEMs and light-source OEMs to develop precision vacuum systems that deliver the maximum reliability for the large investment you make. E-Beam Lithography Solutions E-beam lithography has an important role to play in patterning of silicon wafers. Clean vacuum with low vibration is essential to ensure precision and high up-time of your system. Our Product Solutions You will likely require a turbomolecular pump (TMP) to deliver the ultra-high vacuum on your process tool. Our STP range of TMPs have fully magnetically-levitated rotors to reduce the risk of contamination to the chamber and extend service intervals. Today’s products have been developed to reduce total costs and footprint through integration of the controller into the pump itself, removing the need for an external controller and hefty control cable between the controller and pump.
Chemical Vapour Deposition Chemical Vapour Deposition (CVD) systems come in a variety of configurations to deposit numerous types of films. The processes also operate at different pressures and flow regimes, many using fluorinecontaining dry clean processes. All of these variables mean you will want to consult with one of our application engineers to select the right pump and gas abatement system to maximise your product’s service interval and increase the up-time of your process. Dry Pump Selection CVD processes generally have four specific challenges to overcome that will drive your dry pump product selection. These challenges are: Powder Many processes can generate large amounts of powder by-product. The vacuum pump needs to be designed to handle this powder without seizing. In some cases, the powder may actually be sticky or require high temperature operation to ensure that other by-products entrained in the powders do not condense inside the pump and jam the mechanism. For nearly all powder-producing processes, you will be driven toward using a pump employing a high-torque motor to be sure that the pump keeps rotating under stress. Condensation Some of the by-products of the semiconductor process contain gases that will change from gas phase to solid phase as the partial pressure of the gas increases, or the material comes in contact with cold surfaces. When pumping these by-products, you will need a very hot pump and, preferably, a pump that has a uniform temperature profile from inlet to outlet as much as possible.
Shop online at shop.edwardsvacuum.com
Contact our customer service team
Semiconductor Processing
49.
Corrosion Some processes will require the pumping of halides. In particular, fluorine-containing cleaning processes will be required to maintain the cleanliness of your chamber, but the activated fluorine radicals can attack the internal surfaces of the pump. If the process is mostly using chemicals that can corrode the pump, you will want to be sure that the pump temperature can be set to a low value to reduce the risk of corrosion. Our pumps are designed with selectable temperature set points and high rotational speeds to reduce the risk of corrosion and reduce the overall rate of inevitable material loss that can occur within the pump. For some CVD processes, a balance is struck with the temperature set point to be sure that any condensation issues are avoided without undue rates of corrosion. Metal Plating Some of today’s processes use metal-organic precursors that, as they pass through the chamber, can result in by-products that have a high risk of depositing their metal contents onto the pump surfaces. A low temperature pump is usually best to ensure long service intervals for these applications. Gas Abatement Selection Every CVD process will require some form of gas abatement device so that the toxic and dangerous by-products of the process can be safely converted into disposable elements. We pride ourselves on our fuel-fired exhaust gas management devices because of their ability to efficiently force recombination of the by-products into safe compounds. Being fuel-fired with multiple-inlet capability, you can get rapid deployment of Green Mode by turning off the main burner when you do not need to abate your process exhaust. Integrated Systems and Sub-Fab Solutions With just a pump and a gas abatement device, you are still not ready to run your process. You will need to connect the pump exhaust, connect up your line heaters where required, run your water, purge and electrical lines, and then get all of your control signals ready. You will also have to consider double-enclosure, gas leak detection, and how you want to conduct leak checks after your tool maintenance. All of these things will cost you design time and money. We understand the problem so we have developed integrated, process-specific solutions. Our integrated systems are already pre-designed for most semiconductor CVD processes. The exhaust heaters are set for the correct temperature to minimise cost and maximise up-time. We put leak check ports and gate valves where they are required. We can mount toxic gas sensors within the unit and get the whole system enclosed and, most importantly, you only need to provide one of each of the required utilities. We distribute the purge, water, electricity, and control signals where they are needed and create a ready-to-go system. All of our integrated systems have been designed based on global experience. We are leaders in vacuum and abatement, so we know what works. We constantly innovate and improve what we do because you demand excellence from Edwards. Fleet Management With all of our equipment deployed in your fab, you will want to know what’s going on all of the time. You want to know if any product is in trouble or in need of maintenance. To answer this question, we offer our FabWorks computer monitoring system. The FabWorks system can use Ethernet connectivity to all of our products to constantly retrieve status signals and store them in an automated database. More than tracking trends in such parameters as input power, current, temperature, or purge flow, you also can see warnings or alarms, all of this data can be graphed and exported. With FabWorks you do not need to be in the fab to monitor the equipment, once connected to your intranet, you can be confident you have your finger on the pulse of the sub-fab. For CVD processing, there will always be products that become stressed and will need maintenance, in worst case scenarios, products can suddenly fail. To prevent unwanted failures, we can work with you and deploy our automated predictive diagnostics models. These models, matched to your process, can provide warnings to you in advance of processing your next batch of wafers so that you can maintain the pump or abatement device and reduce the risk of stoppage mid-process.
50.
Semiconductor Processing
Etching Etch processes have become increasingly complex due to the fine feature size of many semiconductors. Moreover, the proliferation of MEMS devices and 3D structures has increased the use of silicon etch processes for structures with high aspect ratio. Traditionally, etch processes could be grouped into silicon, oxide, and metal categories. The lines between these categories have become blurred with the use of more hard masks and high-k materials being deployed in devices today. Some of the materials used in devices today stubbornly resist vapourising during the etch process leading to deposition within the vacuum components. Today’s processes really have become more challenging than they were several years ago. We keep a close eye on industry and process changes and maintain the pace of product innovation to deliver class-leading performance. Vacuum Pump Selection Nearly every dry etch process will require a turbomolecular pump (TMP) to deliver the low pressure you require for your reactive ion etch (RIE) system. Edwards invented the first TMP and we continue to challenge the industry with new technology and performance. We offer a range of products to match your application requirements. For example, for extremely low pressure, you can use one of our all-bladed TMPs and marvel at the achieved compression ratios and low base pressure. You can select a hybrid product that combines blades and Holweckdesigned rotors for high flow operation. We even have products tuned for excellent hydrogen performance because, at molecular speeds, not all molecules behave the same as they travel through the TMP. We recognise that space is at a premium so for many of our TMPs we have integrated the controller with the pump. Not only do you no longer need to worry about routing of cumbersome control cables, you save on rack space and spare pump management. We have also developed advanced heating technology to reduce the risk of stubborn gases from sticking to the pump internal surfaces. We have even pioneered new high-emissivity coatings for really difficult applications that need high running temperatures. For dry pumps, Edwards will help you select your product to be sure that maximum up-time is achieved. Etch processes can be very challenging to the pump because of the various gases used. For example, will your process be mostly corrosive to the pump, likely to condense within the pump, or neither of these? The process gases you use and the likely by-products need to be considered carefully. Gas Abatement Selection Dry etch processes will require some form of gas abatement to be sure you comply with your local emissions requirements. Moreover, oxide etch, in particular, generates perfluorocarbon (PFC) emissions and you want to be sure that your gas abatement can handle the flow rate of PFCs in your process recipe. PFCs are a known contributor to global warming, so your abatement strategy is important for all of us. Our inward-fired burners are particularly adept at creating a hot flame that can break down the incoming gases and reduce emissions of unwanted chemicals.
Physical Vapour Deposition Physical Vapour Deposition (PVD) continues to be an important process in semiconductor manufacturing. Liners and barriers continue to make use of this well established semiconductor process. If you are using a cluster tool, you will require a pump for your load-lock chamber and also the transfer chamber. If your PVD tool makes use of cryo pumps, you will also need to prepare a pump to regenerate your cryo pump once it gets full. In many cases, the pump used for the transfer chamber can also be used to regenerate your cryo pump. Many PVD tools used for semiconductor processing deploy cryo pumps. However, increasingly, turbomolecular pumps (TMPs) are used because the TMPs do not need maintenance and they do not need regeneration. These two factors reduce your running costs. Traditionally, gas abatement is not required for PVD processes. However, if your PVD process tool also includes ALD or CVD chambers, you will need process-ready vacuum pumps and gas abatement. Our application engineers and product specialists will assist you in further information related to these process types and help you determine the optimum size of pump for your system. We can also make recommendations about pipe sizes to help you optimise your PVD system. Shop online at shop.edwardsvacuum.com
Contact our customer service team
Semiconductor Processing
51.
Metrology Today’s metrology tools represent years of advanced development and continue to play a vital role to high yield and early detection of process deviation. Clean, quiet vacuum is an important enabler to advanced metrology tools. We provide a range of dry pumps and turbomolecular pumps (TMPs) to match your vacuum environment conditions. An example of our application of advanced technology is our EPX range of dry pumps. These single-axis pumps rotate at high speeds and can deliver final vacuum pressures up to three orders of magnitude lower than conventional dry pump and booster combinations. In many cases, using one EPX pump can eliminate the need for a TMP. Another example of clean vacuum is our nXDS range of dry scroll pumps. Edwards’ patented technology makes use of a precision engineered bellows that guarantees that no grease from the bearings can ever outgas into the vacuum space. Moreover, advances in tip seal engineering means significantly extended service intervals.
Ion Implantation Ion implant tools still have a significant role to play in front end-of-line processing. The vacuum challenges associated with ion implantation have not become easier with time and we recognise the challenges of operating a vacuum pump in an electrically noisy environment. We are never satisfied by testing for bare minimum conformance to established electromagnetic immunity test standards. We know that pumps used on implant tools will require greater immunity and special design features to be sure that the high voltage sections of the implant tool do not interfere with pump reliability. We also take particular care in the design of our turbomolecular pumps (TMPs) to be sure that we can provide integrated heating to high temperatures so that maximum reliability is achieved. Our application engineers will help you to select the right products for your implant tool, whether those products are mounted on your tool or beneath your tool in the sub-fab. We want to be sure you experience the quality and reliability you demand from Edwards.
Diffusion / Epitaxy / ALD Diffusion, epitaxy, and ALD processes are critical in the manufacture of advanced semiconductor devices. Each of these applications, well understood by Edwards, can represent challenges slightly different to normal CVD processes. Diffusion furnaces will continue to be required as the industry follows Moore’s Law and also if it diverges into More-than-Moore technologies. In general, large capacity pumps are required to provide rapid chamber evacuation, chamber environment exchange, and high throughput capability. Epitaxial film deposition equipment continues to be challenging. In many cases, very high flows of hydrogen at low chamber pressures may be required. You will need a reliable pump with high hydrogen gas throughput capability. More than this, you will want to take advantage of our global application experience to be sure that you design your entire vacuum system for safe operation. By-products of the epitaxy processes can be very hazardous and will require special attention for safe operation. Atomic Layer Deposition (ALD) processes are becoming more common as device feature size decreases. Whether your system processes wafers one wafer at a time, or in a batch, you will want to use our products that are designed to minimise gas residence time and optimise pump thermal profiles and purge locations to be sure you can achieve the longest service interval possible. ALD processes can be rather challenging. For all of the diffusion, epitaxy, and ALD processes, we are able to give you the facts to help you select the right gas abatement device. The materials you use in your processes and maximum flow rates will need to be considered in configuring your abatement device. Where appropriate an integrated system that incorporates our global knowledge and best operating practice should be the preferred solution. Our integrated systems provide excellent value and make managing your process tools much easier via connection to our fab-wide monitoring systems.
52.
Semiconductor Processing
STEEL DEGASSING
OUR EXTENSIVE EXPERIENCE IS KEY TO YOUR SUCCESS
Steel Degassing 54 VD and VOD Processes 55 RH Processes 55
Shop online at shop.edwardsvacuum.com
Contact our customer service team
53.
STEEL DEGASSING Our leading market position as a vacuum supplier for steel degassing is built on our understanding of customers’ processes and expertise in providing vacuum solutions for vacuum degassing (VD), vacuum oxygen decarburising (VOD) and Ruhrstahl Heraeus (RH) processes. We have by far the largest installed base of dry pumps in the global steel industry with a global footprint of manufacturing, sales and service. Benefits: • Fast return on investment - no waste disposal and lower energy cost than steam ejectors • Trusted and proven technology - largest dry pump installed base in the global steel industry • Configured to your process - modular design with different pump ranges for all heat sizes • Ease of adoption - simple installation, fast commissioning, reliable production • High productivity - system design concept ensures high uptime • Low cost of ownership - robust pump design with minimal routine maintenance • Your partner throughout the journey - all your vacuum requirements provided by a single source, from pump manufacturing, system design, testing to service
●
54.
Standard Steel Degassing System
Sport Steel Degassing System
Vacuum Degassing (VD)
●
●
●
Vacuum Oxygen Decarburising (VOD)
●
●
●
Vacuum Degassing with Oxygen Blow (VD OB)
●
●
●
Super Steel Degassing System
Maxx Steel Degassing System Applications
Pumping Technology
Ruhrstahl Heraeus (RH)
●
Ruhrstahl Heraeus with Oxygen Blow (RH OB)
●
Recommended Technology
Steel Degassing
VD and VOD Processes Processes in the growing secondary metallurgy sector depend on several vacuum-based treatments: Vacuum Degassing (VD) for alloy steels; Vacuum Oxygen Decarburising (VOD) for stainless steels; and combinations of both treatments, for example Vacuum Degassing Oxygen Blowing (VDOB) and Vacuum Carbon Decarburising (VCD), for low and ultra-low carbon steels. Our vacuum systems have been successfully applied to all these secondary metallurgy processes at customers’ production facilities around the world. With the proven modular system design we enable degassing and decarburising melt sizes up to 200 tonnes in electric steelmaking facilities (mini-mills).
RH Processes In large integrated steelmaking facilities, typically equipped with basic oxygen converters, secondary metallurgical processing is carried out mainly in Ruhrstahl Heraeus (RH) systems. We have developed a ‘super’ degasser module to address the high volume flow rates needed to successfully degas and decarburise steel products, using multiple high volumetric flow boosters in parallel to handle the gas loads produced, while optimising the total number of system elements required.
Recommended Technology: Standard Steel Degassing Modules (SSDM)
• Modular design with different pump ranges for all heat sizes - configured to your needs • No water disposal and lower energy cost than steam ejectors - low cost of ownership • Simple installation, fast commissioning, reliable production
Shop online at shop.edwardsvacuum.com
MAXX Modules
• Easy to upgrade whenever you need more capacity • Easy integration with other systems - reduced installation cost • Low utilities and energy usage costs - substantial savings
Contact our customer service team
Steel Degassing
55.
EDWARDS
OUR PRODUCTS
Small Pumps and Pumping Systems
59
Small Dry Pumps
65
nXDS Dry Scroll Pump XDS Scroll Vacuum Pump XDS100B Booster Pump XDD1 Diaphragm Vacuum Pump D-LAB Diaphragm Vacuum Pump
67 73 79 83 87
Small Wet Pumps
95
E2M0.7 & 1.5 Oil Sealed Rotary Vane Pumps RV Oil-Sealed Rotary Vane Pump EM18 & 28 Oil Sealed Rotary Vane Pumps
97 101 113
Medium and Large Dry Pumps and Systems
125
Drystar 80 Pump and Booster Package 129 iXL Dry Pump Systems 133 GX Dry Pump Systems 137 iXH Dry Pump Systems 141 GXS Dry Pump 145 GXS/pXH Dry Pump 157 IDX 1000/1300 Dry Pump 163 EPX Semiconductor Pump 167
56.
Mechanical Boosters
177
EH Mechanical Booster Pump pXH Mechanical Booster Pumps Stokes 6” Series Mechanical Booster Pump HV8000 Mechanical Booster Pump HV30000/40000 Mechanical Booster Pump
179 187 191 201 205
Medium and Large Wet Pumps
213
ES Rotary Vane Pump ES Pump and Booster Combinations E2M40 & 80 Oil-Sealed Rotary Vane Pumps E2M175 & 275 Oil-Sealed Rotary Vane Pumps EM Pump and EH Booster Combinations Stokes Microvac Series Oil Sealed Rotary Piston Pump
219 229 235 243 249 251
MV Series Vertically Oriented Microvac Booster Combinations Stokes 1700 Series Mechanical Booster Combinations
260 263
Dry Pumps and Systems for Hazardous Applications 277 CXS Chemical Dry Pump CDX Dry Vacuum Pump EDP Chemical Dry Pump
281 289 295
Turbomolecular Pumps
305
nEXT Turbomolecular Pump 309 EXT Turbomolecular Pump 317 nEXT Turbomolecular pumping Station 322 T-Station 75 Turbomolecular pumping System 324 TAG Controller 328 TIC Turbo and Instrument Controller 330 STP Turbomolecular Pumps 335 STP Integrated Controller Pump 339 SCU-350 Control Unit 354 SCU-800 Control Unit 356 SCU-1600 Control Unit 358 Oil Vapour Diffusion Pumps
363
HT Diffusion Pump Vapour Booster Pump Vapour Pumps for Scientific Instruments and R&D Applications
367 375
Liquid Ring Pumps for the Power Industry
389
Liquid Ring Pumps for the Power Industry
391
UHV Pumps
399
Gamma Ion Pumps Titanium Sublimation Pumping (TSP) Digitel™ ion Pump Controllers
401 405 409
381
Vacuum Instruments
413
Vacuum Measurement and Control Systems APG100 Active Pirani Vacuum Gauge APGX-H Active Linear Convection Gauge ATC Active Thermocouple Gauge ASG2 Active Strain Gauge AIM-X Active Inverted Magnetron Gauge WRG Active Wide Range Gauge AIGX Active Ion Gauge CG16K Dial Gauge IS16K Vacuum Interlock Switch VS16K Adjustable Vacuum Switch TIC 6 Gauge Controller TIC Relay Boxes Profibus Communications Module ADC Active Digital Controller GasCheck G3
414 418 422 426 430 434 438 442 446 448 450 452 456 460 464 468
Vacuum Fittings and Valves
471
Speedivalve IBV Series Vacuum Ball Valve PVMK Manual Operation Right Angle Isolation Valve IPVMK Manual Operation In-line Isolation Valves PVPK Pneumatic Operation Right Angle Isolation Valve IPVPK Pneumatic Operation In-Line Isolation Valve PVEK Solenoid Operation Right Angle Isolation Valve IPVEK Solenoid Operation In-Line Isolation Valve LCPVEK Solenoid Operation Isolation Valve SIPVP Soft-Start Isolation Valve BGV Manual Gate Valve BGV Pneumatic Gate Valve GV Manual and Pneumatic Gate Valve QSB Quarter Swing Butterfly Valve AV5A Air Admittance Valve With Coupling AV10K Air Admittance Valve IPVA10EK Air Admit Valve NW10 LV10K Leak Valve NW10 Flanges
474 476
Electropneumatic Control Valve Flange Fittings Cord and Tubing
530 534 570
Lubricants and Sealants
573
Oils, Fluids, Sealants and Greases 574 Mechanical Pump Oil Selection Chart 577 Vapour Pump Fluids 579 Edwards Silicone Fluids 580 Vapour Pump Fluid Selection Chart 582 Greases and Waxes 583 Exhaust Gas Management
587
Exhaust Management for Semiconductor Processes 588 Product Selection Guide 590 Service
593
Global Support from Edwards 596 Guide to Pump Selection and Pipe Installation 597 Conversions 601 Material Safety Data Sheets 602
478 480 482 486 490 494 498 500 504 508 512 518 522 524 526 528
Shop online at shop.edwardsvacuum.com
Contact our customer service team
57.
This page has intentionally been left blank
58.
SMALL PUMPS AND PUMPING SYSTEMS
THE INTELLIGENT CHOICE
Small Pumps and Pumping Systems Small Pumps: Application and Accessory Information Small Pumps and Accessories: Frequently Asked Questions
Shop online at shop.edwardsvacuum.com
Contact our customer service team
60 61 63
59.
Small Pumps and Pumping Systems To meet the diverse needs of applications ranging from analytical instrumentation, wet chemistry and R&D to light industrial, Edwards offers a comprehensive range of different pumping technologies. Refer to the application and accessory guide to select pumps and accessories for your application. Oil Free Scroll Pumps Scroll pumps are an excellent alternative to rotary vane pumps where oil free pumping is desirable. The innovative XDS pumps in particular use a bearing shield to isolate the vacuum environment from all forms of lubricant not only making them totally dry, but also protecting the bearing from any process gases. Vapour handling is enabled by a gas ballast; this allows the range of pumps to satisfy many applications that were previously off limits to scroll pumps. • ≤ 2 x 10-2 mbar / ≤ 1.5 x 10-2 Torr • 5 to 35 m3h-1 / 2.9 to 20.6 ft3min-1
Oil free scroll pumps
Oil Sealed Rotary Vane Pumps • ≤ 10-3 mbar / ≤ 10-3 Torr • 0.9 to 32.3 m3h-1 / 0.5 to 19.5 ft3min-1 • This wide range of rugged pumps offers an excellent ultimate with good pumping speed. RV pumps have superior vapour handling capabilities, while operating quietly.
Oil sealed rotary vane pumps
Oil Free Diaphragm Pumps • ≤ 2 mbar / ≤ 1.5 Torr • 0.6 to 2.0 m3h-1 / 0.35 to 1.2 ft3min-1 The D-LAB diaphragm pumps are made of corrosion resistant materials to withstand attack from chemicals. They are ideal for applications such as gel drying and other wet chemistry processes. The XDD1 diaphragm pumps provide oil free backing for compound turbomolecular pumps.
Easy to Service
Quality Manufacture
All Edwards pumps are designed for easy routine maintenance. Key components are easily accessible and, with RV and XDS pumps, no special tools are required. Service kits of guaranteed parts are available for routine service by the user. Worldwide support from the Edwards service organisation is also available.
Edwards pumps are manufactured on state of the art machine tools for high consistency of components. For example, RV rotors are manufactured in a robotic cell to remove errors and inconsistencies from the manufacturing process.
Applications Edwards high performance pumps are used in many industrial and laboratory applications, including the following: • Electron microscopes, mass spectrometry, residual gas analysers and surface analysis • Epoxy degassing, powder materials processing • Solvent concentration • Sterilization, distillation and centrifuges • Gel dryers and glove boxes
60.
Small Pumps and Pumping Systems
• Atomic emission spectrometers, nuclear physics, fusion technology and space research • Vacuum ovens • TV tube evacuation • Automotive system filling • Freeze drying • Vacuum metallurgy
Small Pumps: Application and Accessory Information Use the information in the list below to select the best pump and accessories for your application. The information is given as a guide only; the optimum set-up may depend on your specific method of operation. Note that you need to buy the accessories separately, unless otherwise stated. ATEX and Flammable Gases The following standard pump models have an internal ATEX classification of II 3 G c IIB T4: • E2M0.7, E2M1.5 • E1M18, E2M18 & E2M28 • RV3, RV5, RV8, RV12 • nXDS6i, nXDS10i, nXDS15i, nXDS20i, XDS35i The following standard pump models operating on hydrocarbon oil can be supplied with flameproof motors providing an external classification of II 2 G IIB T4 (or IIC): • RV3, RV5, RV8, RV12 • E1M18, E2M18
Gel Dryers Recommended pump: nXDS/XDS or DLAB. Suggested accessories for DLAB: Separator. Optional accessories for DLAB: Condenser, gas ballast valve.
MS Inlet Systems (like Electro-Spray) Recommended pump: XDS35i or E2M28. Suggested accessories for rotary pumps: Mist filter, oil return. Suggested accessories for nXDS/XDS: Silencer.
Rotary Evaporation and Vacuum Ovens Recommended pump: nXDS/XDS or DLAB. Suggested accessories for DLAB: Separator. Optional accessories for DLAB: Condenser, gas ballast valve.
Load Locks, Fume Hoods and Glove Boxes Recommended pump: nXDS/XDS or Rotary pumps. Suggested accessories for rotary pumps: Mist filter, oil return. Suggested accessories for nXDS/XDS: Silencer.
Centrifugal Concentration Recommended pump: nXDS/XDS.
Ultra High Speed Centrifuges Recommended pump: nXDS/XDS or Rotary pumps. Suggested accessories: Mist filter Suggested accessories for rotary pumps: Mist filters, oil return.
Vacuum Filtration Recommended pump: nXDS/XDS or DLAB. Suggested accessories for DLAB: Separator. Optional accessories for DLAB: Condenser, gas ballast valve. Distillation/Extraction Apparatus Recommended pump: nXDS/XDS or DLAB. Suggested accessories for DLAB: Separator. Optional accessories for DLAB: Condenser, gas ballast valve. Freeze Dryers Recommended pump: nXDS/XDS or Rotary pumps. Suggested accessories: Mist filters, oil return.
Shop online at shop.edwardsvacuum.com
Leak Detection, Electron Microscopes, Mass Spectrometers and Lasers Recommended pump: nXDS/XDS or Rotary pumps. Suggested accessories for rotary pumps: FL20K, Mist filter. Suggested accessories for nXDS/XDS: Silencer. Surface Science and Particle Size Analysers Recommended pump: nXDS/XDS or Rotary pumps. Suggested accessories for rotary pumps: FL20K, Mist filter. Suggested accessories for nXDS/XDS: Silencer.
Contact our customer service team
Small Pumps and Pumping Systems
61.
High Energy Physics Recommended pump: nXDS/XDS or Rotary pumps. Suggested accessories for rotary pumps: FL20K, Mist filter. Suggested accessories for nXDS/XDS: Silencer.
Refrigeration, Air Conditioning Systems Recommended pump: nXDS/XDS or Rotary pumps. Suggested accessories for rotary pumps: FL20K, Mist filter. Suggested accessories for nXDS/XDS: Silencer.
Helium or Rare Gas Recirculation Recommended pumps: nXDS/XDS
Vacuum Furnace Recommended pump: nXDS/XDS or Rotary pumps. Suggested accessories for rotary pumps: ITF20K, Mist filter. Suggested accessories for nXDS/XDS: Silencer.
Backing Turbomolecular Pumps Recommended pump: nXDS/XDS, XDD1 or Rotary pumps. Suggested accessories for rotary pumps: FL20K, Mist filter. Suggested accessories for nXDS/XDS: Silencer.
Azide Forming Applications Recommended pump: nXDS/XDS or Rotary pumps. Suggested accessories for rotary pumps: Mist filter. Suggested accessories for nXDS/XDS: Silencer.
Backing Diffusion Pumps Recommended pump: nXDS/XDS or Rotary pumps. Suggested accessories for rotary pumps: FL20K, Mist filter. Suggested accessories for nXDS/XDS: Silencer. Notes • FL20K is an inlet trap, to prevent oil back-streaming. • ITF20K is an inlet trap, to capture dust particles. • The gas ballast facility allows atmospheric air into the pump, minimising the formation of condensates (which contaminate the oil in rotary pumps). • An oil return kit is available for E2M0.7, E2M1.5, RV, EM18 and E2M28 pumps to allow oil to be returned from the mist filter to the pump. A gas ballast oil return is also available to allow oil to return and have gas ballast flow.
62.
Small Pumps and Pumping Systems
Small Pumps and Accessories: Frequently Asked Questions Oil Mist Question: What accessory do I use to trap oil mist (which all oil sealed pumps emit during pump down or with gas ballast)? Answer: To meet regulations and preserve pump oil, fit a recommended Edwards oil mist filter (EMF) to the pump outlet, and connect the exhaust to an exhaust line. Question: If I operate an RV pump continuously or with high inlet pressure, what accessories do I need? Answer: Fit an Edwards mist filter (EMF) and a gas ballast oil return (GBOR) kit. Then the pump can be operated with the mode switch open and gas ballast oil return. The oil condensed in the filter will be continuously returned to the pump oil box.
Vapour Processes Question: Which pump and accessories should I use if my process generates vapours which could condense in the pump? Answer: You can choose either an nXDS/XDS pump, or rotary pump. Gas ballast should be used with both pumps; to sweep the vapour through the pump. This prevents condensation and oil contamination. Operate the pump with gas ballast for at least an hour before and after use. Choose the size of pump taking into account the vapour pumping rate. If you selected a rotary pump, then you should fit a gas ballast oil return kit and mist filter. Change the oil frequently and keep an oil change reminder tag on the pump. DLAB would also be a suitable alternative depending on required pumping speed.
Dust and Particle Processes Question: Which pump and accessory should I use if my process generates dust or grit, which could clog or damage the pump? Answer: Use a rotary pump fitted with an inlet dust filter. We do not recommend the use of scroll pumps or XDD1 pumps for these applications.
Special Chemical Cleaning Processes Question: Which pump and accessory should I use if my process generates oxygen or ozone? Answer: Use a rotary pump adapted to run with Fomblin® oil or nXDS/ XDS. Contact Edwards for more information. Question: Are there any special considerations if my pump will be used in the vicinity of organic gases, like propane? Answer: Use a rotary pump fitted with a flameproof motor. Contact Edwards for more information.
Contamination Question: Which pump and accessories should I use if I must ensure that my process and process chamber (operated below 0.1) are not contaminated with oil from the pump? Answer: Use an nXDS/XDS scroll pump. Alternatively, you can use a rotary pump with a FL20K foreline trap fitted to the system inlet. The trap contains activated alumina which traps the oil molecules. To maintain the alumina charge, bake the charge basket or replace as required. Question: How can I reduce the noise level of my pump? Answer: If the noise is only obvious during pumping down then fitting the exhaust with a silencer (nXDS/XDS pumps), or fitting an exhaust line will reduce the level. An alternative is to fit an acoustic enclosure. Contact Edwards for more information. Fomblin® is a registered trademark of Solvay Solexis Shop online at shop.edwardsvacuum.com
Contact our customer service team
Small Pumps and Pumping Systems
63.
This page has intentionally been left blank
64.
SMALL DRY PUMPS
THE INTELLIGENT CHOICE
nXDS Dry Scroll Pump 67 XDS Scroll Vacuum Pump 73 XDS100B Booster Pump 79 XDD1 Diaphragm Vacuum Pump 83 D-LAB Diaphragm Vacuum Pump 87
Shop online at shop.edwardsvacuum.com
Contact our customer service team
65.
This page has intentionally been left blank
66.
Small Dry Pumps
nXDS DRY SCROLL PUMP THE ULTIMATE DRY CHOICE
The nXDS is the next generation in completely oil free, dry scroll pumps and replaces the XDS5 and XDS10. nXDS improves on the original XDS pumps by offering increased pumping speeds, combined with lower ultimate pressures, lower power consumption and lower noise. Gas ballast allows for pumping of condensable vapours including, water, solvents, dilute acids and bases. nXDS pumps also feature the latest in tip seal technology giving significantly longer life between tip seal changes. Integrated inverter drive with auto sensing voltage input delivers optimised pumping performance globally. nXDS pumps are designed to be completely field serviceable.
Features and Benefits • • •
•
Better work environment and low environmental impact - quiet operation Simple operation - intelligent and easy to use controls No contamination and no oil to dispose of hermetically sealed for a lubricant-free vacuum environment Low cost of ownership - long service interval and low power consumption from a single sided scroll arrangement
Applications • • • • •
General clean pumping applications Scanning Electron Microscopes - SEM Beam lines and high energy physics Backing turbo pumps Centrifuges, ultra-high speed
Pump Range nXDS6i -- nXDS6i -- nXDS6iC -- nXDS6iR
nXDS15i -- nXDS15i -- nXDS15iC -- nXDS15iR
nXDS10i -- nXDS10i -- nXDS10iC -- nXDS10iR
nXDS20i -- nXDS20i -- nXDS20iC -- nXDS20iR
C Version. More Chemically resistant version fitted with Chemraz internal valves and stainless steel fittings R Version. For gas recirculation with gas ballast feature blanked off Chemraz is a registered trademark of Greene Tweed
Shop online at shop.edwardsvacuum.com
Contact our customer service team
Small Dry Pumps
67.
Performance Curves nXDS6i Dry Scoll Pump nXDS6i Performance Curve
nXDS6i Peak Pumping Speed 6.2 m3h-1 (3.6 ft3min-1) Ultimate Pressure 0.020 mbar (0.015 Torr)
Ordering information Product description
Order no:
nXDS6i 100 - 240 V, 50 - 60 Hz, Single Phase
A73501983
1
Normal Pumping Speed
4
min Standby Power
nXDS6iC 100 - 127 V, 200 - 240 V, 1ph 50 - 60 Hz
A73502983
2
Normal Full Power
5
min Standby speed
nXDS6iR 100 - 127 V, 200 - 240 V, 1ph 50 - 60 Hz
A73503983
3
Normal GB Speed
nXDS10i Dry Scoll Pump nXDS10i
nXDS10i Performance Curve Peak Pumping Speed 11.4 m3h-1 (6.7 ft3min-1) Ultimate Pressure 0.007 mbar (0.005 Torr)
Ordering information Product description
68.
Order no:
nXDS10i 100 - 240 V, 50 - 60 Hz, Single Phase
A73601983
nXDS10iC 100 - 127 V, 200 - 240 V, 1ph 50 - 60 Hz
A73602983
nXDS10iR 100 - 127 V, 200 - 240 V, 1ph 50 - 60 Hz
A73603983
Small Dry Pumps
1
Normal Pumping Speed
4
min Standby Power
2
Normal Full Power
5
min Standby speed
3
Normal GB Speed
nXDS15i Dry Scoll Pump nXDS15i
nXDS15i Performance Curve Peak Pumping Speed 15.1 m3h-1 (8.9 ft3min-1) Ultimate Pressure 0.007 mbar (0.005 Torr)
Product description 1
Normal Pumping Speed
2
Normal Full Power
3
Normal GB Speed
4 5
Order no:
min Standby Power
nXDS15i 100 - 240 V, 50 - 60 Hz, Single Phase
A73701983
min Standby speed
nXDS15iC 100 - 127 V, 200 - 240 V, 1ph 50 - 60 Hz
A73702983
nXDS15iR 100 - 127 V, 200 - 240 V, 1ph 50 - 60 Hz
A73703983
nXDS20i Dry Scoll Pump nXDS20i Performance Curve
nXDS20i Peak Pumping Speed 22.0 m3h-1 (13.0 ft3min-1) Ultimate Pressure 0.030 mbar (0.022 Torr)
Product description
Order no:
Normal Pumping Speed
4
min Standby Power
nXDS20i 100 - 240 V, 50 - 60 Hz, Single Phase
A73001983
2
Normal Full Power
5
min Standby speed
nXDS20iC 100 - 127 V, 200 - 240 V, 1ph 50 - 60 Hz
A73802983
3
Normal GB Speed
nXDS20iR 100 - 127 V, 200 - 240 V, 1ph 50 - 60 Hz
A73803983
1
Shop online at shop.edwardsvacuum.com
Contact our customer service team
Small Dry Pumps
69.
Dimensions nXDS Dimensions
Pump views
149
145
302.3
160
266
285
55
189 265 432 225
347
295
120
230
A
B
A
9 mm wide slots 4 off
B
Rubber feet 4 off
All variants are the same Dimensions in mm (in)
70.
Small Dry Pumps
Technical Data Units
nXDS6i
nXDS10i
nXDS15i
nXDS20i
12.7/ 7.5
17.1/ 10.1
28.0/ 16.5
15.1/ 8.9
Nominal rotational speed
rpm
1800
Displacement
m3h-1 / ft3min-1
6.8/ 4.0
Peak pumping speed
m h / ft min
6.2/ 3.6
11.4/ 6.7
Ultimate vacuum (total pressure)
mbar/ Torr
0.020/ 0.015
0.007 / 0.005
Minimum standby rotational speed
rpm
1200
3 -1
3
-1
Speed control resolution (percentage of full rotation speed)
1%
Max water vapour pumping rate
gh-1
110
Maximum continuous inlet pressure
mbar
200
Voltage input
V
100-127, 200-240 (+/-10%)
Voltage frequency
Hz
50/60
Motor power 1-ph*
W
260
Power connector 1-ph
IEC EN60320 C13
Recommended fuse
10A, 250Vac rms
Weight
22.0/ 13.0 0.030/ 0.022
kg / lb
Inlet flange
26.2/ 58
145
280
220 50
280
300
260
25.8/ 57
25.2/ 56
25.6/ 56
NW25
Exhaust flange
NW25
Noise level**
dB(A)
Vibration at inlet flange
mms-1(rms)
< 4.5
Leak tightness (static)
mbar ls-1
< 1x10-6
Operating temperature range
o
C/F
52
10 to 40 / 41 to 104
* Typical. ** For low fan speed, typical at ultimate end when load/ambient conditions allow.
Shop online at shop.edwardsvacuum.com
Contact our customer service team
Small Dry Pumps
71.
Service, Spares and Accessories The control cable is used to connect the nXDS pump directly to the RS485 or RS232 serial input on your control equipment or a PC, or alternatively, to an Edwards controller such as a TIC (Turbo Instrument Controller) or TAG (Turbo & Active Gaugecontroller).
Pump-to-Controller Cable Product description
Order no:
Product description
Order no:
Interface cable 1.0 m
D39500835
2m electrical supply cable for 1-ph pumps, UK, Three-pin plug
A50505000
Interface cable 2.0 m
D39500836
2m electrical supply cable for 1-ph pumps, North European plug
A50506000
Interface cable 5.0 m
D39500837
2m electrical supply cable for 1-ph pumps, North America/Japan plug
A50507000
2m electrical supply cable for 1-ph pumps, no plug
A50508000
Gas Ballast Adaptor Product description
Order no:
Gas Ballast adaptor blank
A73501806
Gas Ballast adaptor
A73501809
Exhaust Product description
Order no:
NW25 inlet/outlet exhaust filter silencer
A50597805
Silencer spares kit
A50597800
Exhaust nozzle kit 3/4’’ to 15mm
A50509000
Exhaust Silencer
A50597000
XDS Filter 5 micron element kit
A50597802
XDS Filter 1 micron element Kit
A50597803
Vibration Isolator Product description nXDS vibration isolator (0.45kg)
Order no: A24801411
Chemical Resistance Conversion Unit Product description
Order no:
nXDS6i,10i & 15i chemical resistance conversion unit
A73501807
nXDS20i chemical resistance conversion unit
A73501808
nXDS Kits Product description
Order no:
nXDS Tip Seal Service Kit
A73501801
nXDS Bearing Replacement Kit
A73501802
Service Edwards products, spares and accessories are available from Edwards companies in Belgium, Brazil, China, France, Germany, Israel, Italy, Japan, Korea, Singapore, United Kingdom, U.S.A. and a world-wide network of distributors. The majority of these centres employ Service Engineers who have undergone comprehensive Edwards training courses. Order spare parts and accessories from your nearest Edwards company or distributor. When you order, please state for each part required: • Model and item number of your equipment. • Serial number (if any). • Item number and description of the part.
72.
Small Dry Pumps
XDS SCROLL VACUUM PUMP THE ULTIMATE DRY CHOICE
The XDS35i pump has an innovative bearing shield design that isolates the vacuum environment from all forms of lubricant, not only making it totally dry but hermetically sealed. The XDS46i pump is a development on the XDS35i and thus shares many of the same features and benefits but with a peak speed boosted to 40 m3h-1. The XDS46i is optimised for maximum pumping speed at inlet pressures between 1 mbar and 10 mbar making it ideally suited for LCMS and ICPMS applications requiring a higher pumping speed than that offered by the XDS35i. Recent improvements in tip seal technology have lead to reduced tip seal wear therefore giving a longer time between service interventions.
Features and Benefits
Applications
• Lubricant-free within the vacuum envelope and hermetically sealed means totally clean and dry vacuum to prevent cross contamination • No atmosphere to vacuum shaft seals means bearings are completely isolated, this prevents process attack and means bearings run cooler and last longer • No oil changes required eliminating costs of contaminated oil disposal • Simple single sided scroll design means maintenance is done in minutes for low cost of ownership and maximum up-time • Inverter drive for consistent pumping speed at 50/60Hz
• • • • • • • •
Shop online at shop.edwardsvacuum.com
Clean pumping applications Automotive Beam lines and high energy physics Centrifuges, ultra high speed Coating ICPMS inlet Coating High throughput – LCMS
Pump Range XDS -- XDS35i -- XDS46i
Contact our customer service team
Small Dry Pumps
73.
Performance Curves XDS35i Scroll Vacuum Pump XDS35i Performance Curve
XDS35i Peak Pumping Speed
40 35
35 m h
3 -1
1 x 10-2 mbar
(m3 h -1)
Ultimate Pressure
1
30
(21 ft3min-1)
25 20
2
15 10
(8 x 10-3 Torr)
XDS35i
5 0 10 -3
10
-1
10 -2
10
0
10 -1
10
1
10 0
2
10
10 1
10
3
10 2
10
4
10 3
10
5
(mbar) (Pa)
Ordering information Product description
Order no:
XDS35i 100-120/200-230V, 1-ph, 50/60Hz with an IEC60320 connector, factory set to 230V XDS35i-NGB 1-ph 100-120/200-230V set to 230V
A73001983 A73005983
1
Speed
2
Power
Note: Mains leads must be ordered separately, please see accessories and spares at the end of this section for the relevant standard XDS pump for the correct mains lead.
XDS46i Scroll Vacuum Pump XDS46i Performance Curve
XDS46i Peak Pumping Speed 40 m3h-1
5 x 10-2 mbar
(W)
Ultimate Pressure
(m3 h -1)
(23.5 ft3min-1)
(4 x 10-2 Torr)
XDS46i
(mbar)
Ordering information Product description XDS46i 100-120/200-230V, 1-ph, 50/60Hz with an IEC60320 connector, factory set to 230V
(Pa)
(mbar)
Order no: A73101983
Note: Mains leads must be ordered separately, please see accessories and spares at the end of this section for the relevant standard XDS pump for the correct mains lead.
74.
Small Dry Pumps
1
Speed
2
Power
Dimensions XDS35i/46i Dimensions
Pump views
333 (13.11)
388 (15.28)
50 (1.97)
224 (8.82)
397 (15.63)
180 (7.09)
290 (11.42)
476 (18.74) 212 (8.35)
1
2 A
B 353 (13.90)
XDS35i/ 46i A
150 (5.91)
B
247.5 (9.74)
1
NW40
2
NW25
Shop online at shop.edwardsvacuum.com
Contact our customer service team
Small Dry Pumps
75.
Technical Data Units
XDS46i
Displacement 50 or 60Hz
m h / ft min
43/ 25
60/ 35
m3h-1 / ft3min-1
35 / 21
40 / 23.5
Ultimate vacuum (Total pressure)
mbar/ Torr
1 x 10-2 / 8 x 10-3
5 x 10-2 / 4 x 10-2
Max inlet pressure for water vapour
mbar/ Torr
35 / 23
40 / 30
Max water vapour pumping rate – GB I
gh-1
70
-
Max water vapour pumping rate – GB II
gh
240
-
Max allowed outlet pressure
bar gauge / psig*
0.2/ 2.9
Max allowed inlet and GB pressure
bar gauge / psig*
0.5 / 7
Motor power
kW
0.52
3
-1
-1
Power connector
IEC EN60320 C19
Nominal rotation speed
rpm
1750
Weight
kg / lb
48 / 105
Inlet flange
NW40
Exhaust flange
NW25
Noise level
dB(A)
57
Vibration
mms -1 (rms)